Postdoctoral Researcher – Advanced Material and Membrane Development for Water and Critical Mineral Recovery Applications
UChicago Argonne is hiring for Postdoctoral Researcher – Advanced Material and Membrane Development for Water and Critical Mineral Recovery Applications in Lemont, IL USA. Junior level, $73k–$121k a year stated. First seen November 10, 2026; open as of November 12, 2026. Jobs taken straight from company career pages — no aggregator in between.
With Destava: How well do you fit? · Tailor my résumé · Write a cover letter
- Company
- UChicago Argonne
- Where
- Lemont, IL USA
- Level
- Junior
- Pay stated
- $73k–$121k a year
- First seen
- November 10, 2026
- Listed via
- Workday
What the posting says
We are seeking candidates who will be able to design experiments and develop methodologies to design material compositions and microstructures to achieve desired physics and mass and charge transport properties. As part of the Materials Engineering Research Facilities (MERF), the Nanocomposite Materials and Membrane Manufacturing group perform science-based membrane synthesis and scaleup development by using roll-to-roll manufacturing and machine learning enabled in-line characterization and quality control methods. The group works closely with industry partners and academic collaborators to…
Read more and apply on UChicago Argonne's site
More jobs like this
Polymer Testing Engineer
Save to applyComposite Testing Engineer
Save to applyMetallurgical Engineer | 15+ Years
Save to applyPrincipal Research Engineer - Materials Discovery Research Institute
Save to apply
See all 7 Materials Engineers jobs in Chicago
A search agent finds the jobs this list misses: the ones that mean the same without the same words. Have Destava watch for postdoctoral researcher – advanced material and membrane development for water and critical mineral recovery applications jobs in Lemont, IL USA, new matches every morning on your own account.
This page includes information from the O*NET 31.0 Database by the U.S. Department of Labor, Employment and Training Administration (USDOL/ETA). Used under the CC BY 4.0 license. O*NET® is a trademark of USDOL/ETA.